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Impact of Manufacturing Flow on Yield Losses in Nanoscale Fabrics
Yield Analysis Nanotechnology NASIC Nanowire
2014/12/8
Reliable and scalable manufacturing of nanofabrics entails significant challenges. Scalable nano-manufacturing approaches that employ the use of lithographic masks in conjunction with nanofabrication ...
Critical Area Driven Dummy Fill Insertion to Improve Manufacturing Yield
Dummy fill Manufacturability Critical Area CMP
2014/12/8
Non-planar surface may cause incorrect transfer of patterns during lithography. In today’s IC manufacturing, chemical mechanical polishing (CMP) is used for topographical planarization. Since polish r...
Multitest发布更高测试合格率的Plug&Yield方案.doc （图）
测试 合格率 Plug&Yield方案
2011/10/31
Multitest的Plug Yield™使用户能够将内部资源集中于其核心业务。当Multitest处理测试配置的协调、整合和优化等方面时，Plug Yield™帮助用户节省了时间和资金。该公司还对项目进行从规划到部署阶段的全面管理。